Journal of Photopolymer Science and Technology

Featured article

Volume 36 (2023) Issue 1 Pages 7-10

The Photopolymer Science and Technology Award

Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

The Photopolymer Science and Technology Award No. 232100, the Best Paper Award 2022, was presented to Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe (Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 35, (2022) 61-65, entitled “Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist”.

Volume 36 (2023) Issue 1 Pages 5-6

The Photopolymer Science and Technology Award

Seihou Jinnai, Yutaka Ie

The Photopolymer Science and Technology Award No. 222100, the Best Paper Award 2021, was presented to Seihou Jinnai and Yutaka Ie (The Institute of Scientific and Industrial Research (SANKEN), Osaka University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 34, (2021) 285-290, entitled “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”.

Volume 36 (2023) Issue 1 Pages 3-4

The Photopolymer Science and Technology Award

Tomotaka Tsuchimura

The Photopolymer Science and Technology Award No. 212100, the Best Paper Award 2021, was presented to Tomotaka Tsuchimura (FUJIFILM Corporation) for his outstanding contribution published in Journal of Photopolymer Science and Technology, 33, (2020) 15-26, entitled “Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials”.

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2024 Volume 37 Issue 1

Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography Kaito Yamada, Yoshihiko Hirai, Masaaki Yasuda
Transient Swelling During Development of Poly(methyl methacrylate) Resist Akihiro Konda, Hiroki Yamamoto, Shusuke Yoshitake, Takahiro Kozawa
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function Yasuhiro Funayama, Hisatora Takahashi, Ayumi Kobayashi, Kohei Iritani, Hideyuki Kikuchi, Takashi Yamashita
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers Kyohei Imai, Bunta Inoue, Yoshihiko Hirai, Masaaki Yasuda

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