NOVEL GAP FILLING BARC WITH HIGH CHEMICAL RESISTANCE

Hashimoto, Y; Otagiri, S; Ogata, H; Kamibayashi, S; Endo, T; Endo, Y; Kishioka, T

Hashimoto, Y (reprint author), Nissan Chem Corp, Mat Res Labs, Semicond Mat Res Dept, Toyama, Japan.

2019 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC), 2019; ():

Abstract

In state-of-the-art semiconductor manufacturing processes, a BARC film/process needs to meet a multitude of requirements. In particular, it should pos......

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