CD and OCD sampling scheme optimization for HVM environment

Park, C; Lee, H; Lee, D; Choi, A; Buhl, S; Kim, WS; Groger, P; Guhlemann, S; Kim, S; Kim, M

Park, C (reprint author), SK Hynix R3, Icheon Si, South Korea.

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIII, 2019; 10959 ():

Abstract

In the leading-edge production measuring the geometrical dimensions with e-beam inspection (CD-SEM data) or scatterometry technology (OCD data) is one......

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