DDR Process and Materials for Novel Tone Reverse Technique

Shigaki, S; Shibayama, W; Takeda, S; Tamura, M; Nakajima, M; Sakamoto, R

Shigaki, S (reprint author), Nissan Chem Ind Co Ltd, Mat Res Labs, Semicond Mat Res Dept, 635 Sasakura,Fuchu Machi, Toyama 9392792, Japan.

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX, 2018; 10583 ():

Abstract

We developed the novel process and material which can be created reverse-tone pattern without any collapse. The process was Dry Development Rinse (DDR......

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