Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Peng, XM; Wang, YF; Xu, J; Yuan, H; Wang, LQ; Zhang, T; Guo, XD; Wang, SQ; Li, Y; Yang, GQ

Wang, SQ; Yang, GQ (reprint author), Univ Chinese Acad Sci, Chinese Acad Sci, Inst Chem, Beijing Natl Lab Mol Sci,Key Lab Photochem, Beijing 100190, Peoples R China.; Li, Y (reprint author), Univ Chinese Acad Sci, Chinese Acad Sci, Tech Inst Phys & Chem,

MACROMOLECULAR MATERIALS AND ENGINEERING, 2018; 303 (6):

Abstract

Novel molecular glasses (MGs) containing bisphenol A backbone (BPA-6 and BPA-10) are synthesized and characterized. BPA-6 and BAP-10 are excellent amo......

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