Clean Focus, Dose and CD Metrology for CD Uniformity Improvement

Lee, H; Han, S; Hong, M; Kim, S; Lee, J; Lee, D; Oh, E; Choi, A; Kim, N; Robinson, JC; Mengel, M; Rovira, P; Yoo, S; Getin, R; Choi, D; Jeon, S

Lee, H (reprint author), SK Hynix, 2091 Gyeongchung Daero, Icheon Si 467701, Gyeonggi Do, South Korea.

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXII, 2018; 10585 ():

Abstract

Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manu......

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