Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology

Takamasu, K; Takahashi, S; Kawada, H; Ikota, M

Takamasu, K (reprint author), Univ Tokyo, Dept Precis Engn, Tokyo, Japan.

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2018; 17 (4):

Abstract

Line edge roughness (LER) and linewidth roughness (LWR) of a semiconductor device are important measures for evaluating its performance. Conventionall......

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