Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films

Alcala, R; Richter, C; Materano, M; Lomenzo, PD; Zhou, CZ; Jones, JL; Mikolajick, T; Schroeder, U

Alcala, R (corresponding author), NaMLab gGmbH, Noethnitzer Str 64 a, D-01187 Dresden, Germany.; Alcala, R (corresponding author), Tech Univ Dresden, Chair Nanoelect, Noethnitzer Str 64, D-01187 Dresden, Germany.

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2021; 54 (3):

Abstract

Hafnium oxide (HfO2), zirconium oxide (ZrO2), and the solid-solution (Hf1-xZrxO2) system continue to be some of the most relevant ferroelectric materi......

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