Capability of DUV inspection for the LWR improved EUV mask of sub-15 nm hp on wafer

Naka, M; Chiba, K; Kumada, A; Morishita, K; Takai, K; Yoshikawa, R; Arisawa, Y; Kamo, T; Shiobara, E; Kanamitsu, S

Naka, M (reprint author), Kioxia Corp, Mask Proc Technol Grp, 1 Komukai Toshiba Cho, Kawasaki, Kanagawa 2128583, Japan.

PHOTOMASK TECHNOLOGY 2019, 2019; 11148 ():

Abstract

Deep Ultra Violet (DUV) inspection of Extreme Ultra Violet (EUV) mask has been known for high stability, high throughput, and low cost, since it has b......

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