Effect of temperature on the SU-8 photoresist filling behavior during thermal nanoimprinting

Sun, L; Zou, HL; Sang, SB

Sang, SB (corresponding author), Taiyuan Univ Technol, MicroNano Syst Res Ctr, Key Lab Adv Transducers & Intelligent Control Sys, Minist Educ, Jinzhong, Peoples R China.; Sang, SB (corresponding author), Taiyuan Univ Technol, Coll Informat Engn, Jinzhong, Peoples R China.

POLYMER ENGINEERING AND SCIENCE, 2021; 61 (8): 2222

Abstract

SU-8 photoresist is an ideal thermal-imprinting polymer, which has been widely used in micro-nano devices in recent years. However, the research on th......

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