Chemical reaction on silicon carbide wafer (0 0 0 1 and 0 0 0-1) with water molecules in nanoscale polishing

Tian, ZG; Lu, J; Luo, QF; Xu, XP

Lu, J; Xu, XP (通讯作者)，Huaqiao Univ, Inst Mfg Engn, Xiamen 361021, Peoples R China.

APPLIED SURFACE SCIENCE, 2023; 607 ():

Abstract

Chemical reactions occurring in atomic level are of importance for the nano-manufacturing process. The tri-bochemistry mechanism for the ultra-precisi......

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