Surface activated bonding of ALD Al2O3 films

Wang, JS; Takigawa, R; Suga, T

Suga, T (通讯作者)，Meisei Univ, Collaborat Res Ctr, Tokyo 1918506, Japan.

JAPANESE JOURNAL OF APPLIED PHYSICS, 2023; 62 (SC):

Abstract

Room temperature direct bonding of plasma enhanced ALD Al2O3 films was achieved by using surface activated bonding. ALD Al2O3 films were amorphous wit......

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