DUMMY POLY REMOVAL IN FINFET TECHNOLOGY NODE

Huang, RX; Ji, SL; Han, QH

Huang, RX (reprint author), Semicond Mfg Int Corp, Technol R&D, Shanghai, Peoples R China.

2017 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC 2017), 2017; ( ):

Abstract

When CMOS technology reaches 14nm and beyond, FinFET is implemented to further improve the device performance. Dummy poly removal process works as a k......

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