Machine Learning (ML)-Based Model to Characterize the Line Edge Roughness (LER)-Induced Random Variation in FinFET

Lim, J; Shin, C

Shin, C (corresponding author), Sungkyunkwan Univ, Dept Elect & Comp Engn, Suwon 16419, South Korea.

IEEE ACCESS, 2020; 8 (): 158237

Abstract

ML (Machine Learning)-based artificial neural network (ANN) model is proposed to estimate the LER (line edge roughness)-induced performance variation ......

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