Chemical Mechanical Polishing of TiN Film with Potassium Permanganate and L-Aspartic Acid in Alkaline Slurry

Li, CH; Cai, DL; Feng, DH; Cui, ZJ; Liu, WL; Song, ZT

Li, CH (corresponding author), Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China.; Li, CH (corresponding author), Univ Chinese Acad Sci, Beijing 100049, Peoples R China.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2021; 10 (7):

Abstract

Titanium nitride (TiN) is preferred for use as the bottom electrode contact due to its excellent thermal stability and suitable electrical conductivit......

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