Nanomechanical properties of the ZEP-520 electron beam resist film

Pan, JC; Lang, FC; Zhao, XP; Hou, XH; Li, JJ

Lang, FC (corresponding author), Inner Mongolia Univ Technol, Sch Sci, Hohhot 010051, Peoples R China.

MATERIALS TODAY COMMUNICATIONS, 2021; 27 ():

Abstract

The ZEP-520 electron beam resist has been widely used in electron beam lithography and mask fabrication owing to its high resolution and good sensitiv......

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