Electrical characteristics investigation of ferroelectric memories using stacked and mixed hafnium zirconium oxides

Fang, YW; Yang, ZJ; Liao, RY; Chen, PT; Liu, CB; Huang, KY; Hsu, HH; Cheng, CH; Chou, WC; Lin, SH; Zhou, Y

Hsu, HH (通讯作者),Natl Taipei Univ Technol, Inst Mat Sci & Engn, Taipei, Taiwan.;Zhou, Y (通讯作者),Shenzhen Univ, Inst Adv Study, Shenzhen, Peoples R China.

THIN SOLID FILMS, 2022; 757 ():