Dry etching of palladium thin films in high density plasmas of CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O-2/Ar gas mixtures

Lee, JY; Choi, JS; Cho, DH; Hwang, SM; Chung, CW

Chung, CW (reprint author), Inha Univ, Ctr Design & Applicat Mol Catalysts, Dept Chem & Chem Engn, 100 Inharo, Incheon 22212, South Korea.

THIN SOLID FILMS, 2017; 636 ( ): 325

Abstract

High density plasma etching of Pd thin films masked with TiN films was performed using CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O-2/Ar gas mixtures. The e......

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