Simple ALD process for epsilon-Fe2O3 thin films

Tanskanen, A; Mustonen, O; Karppinen, M

Karppinen, M (reprint author), Aalto Univ, Dept Chem & Mat Sci, FI-00076 Espoo, Finland.

APL MATERIALS, 2017; 5 (5):

Abstract

Atomic layer deposition (ALD) is an advanced industrially feasible technique for fabricating functional materials as high-quality thin films. Here we ......

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