The effects of TMDD-PA concentration on roughness of Si <1 1 0> and etching rate ratio of Si <1 1 0>/<1 1 1> in alkaline KOH solution

Zhu, CL; Jiao, QB; Tan, X; Hu, H; Bayanheshig

Bayanheshig (corresponding author), Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Changchun 130033, Jilin, Peoples R China.

CHEMICAL PHYSICS, 2020; 529 ():

Abstract

High aspect ratio gratings (HARG) can be obtained by anisotropic etching of Si &lt;1 1 0&gt;/&lt;1 1 1&gt;. Usually isopropyl alcohol (IPA) is added t......

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