Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

Wang, DG; Huang, Q; Shi, WQ; You, W; Meyer, TJ

Wang, DG (corresponding author), Chinese Acad Sci, Ningbo Inst Ind Technol, Engn Lab Adv Energy Mat, Ningbo 315201, Zhejiang, Peoples R China.; Wang, DG (corresponding author), CNiTECH, Qianwan Inst, Zhongchuangyi Rd, Hangzhou 315336, Zhejiang, Peoples R China.; Wang, DG; You, W; Meyer, TJ (corresponding author), Univ N Carolina, Dept Chem, Chapel Hill, NC 27599 USA.

TRENDS IN CHEMISTRY, 2021; 3 (1): 59

Abstract

Atomic layer deposition (ALD) has been extensively used in the modification of semiconductor surfaces for scientific and industrial applications. It e......

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