Structure and properties of TiBx coatings deposited via magnetron sputtering with ion source etching

Liang, YP; Liu, F; Wang, QM; Dai, W

Dai, W (corresponding author), Guangdong Univ Technol, Sch Electromech Engn, Guangzhou 510006, Peoples R China.

CERAMICS INTERNATIONAL, 2021; 47 (11): 16009

Abstract

A common issue in sputter-deposited TiBx is that the films contain excess B. Here we deposited TiBx coatings by dc magnetron sputtering combined with ......

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