Complementary etching behavior of alkali, metal-catalyzed chemical, and post-etching of multicrystalline silicon wafers

Zou, S; Ye, XY; Wu, CK; Cheng, KX; Fang, L; Tang, RJ; Shen, MR; Wang, XS; Su, XD

Su, XD (reprint author), Soochow Univ, Sch Phys Sci & Technol, 1 Shizi St, Suzhou 215006, Peoples R China.; Su, XD (reprint author), Soochow Univ, Jiangsu Key Lab Thin Films, 1 Shizi St, Suzhou 215006, Peoples R China.

PROGRESS IN PHOTOVOLTAICS, 2019; 27 (6): 511

Abstract

Both alkali and metal-catalyzed chemical etching (MCCE) of multicrystalline silicon (mc-Si) wafer show anisotropic etching behavior, resulting in diff......

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