Can remote SEM contours be used to match various SEM tools in fabs ?

Pradelles, J; Perraud, L; Sezestre, E; Fay, A; Schuch, N; Figueiro, T; Robert, F

Pradelles, J (通讯作者),Univ Grenoble Alpes, CEA, Leti, F-38000 Grenoble, France.

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII, 2023; 12496 ():

Abstract

Background: CD-SEM is one of the workhorse metrology tools for evaluating the patterning performances in the semiconductor industry. With the continuo......

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