Technology of static oblique lithography used to improve the fidelity of lithography pattern based on DMD projection lithography

Huang, L; Liu, CX; Zhang, H; Zhao, SQ; Tan, MY; Liu, MZ; Jia, ZQ; Zhai, RZ; Liu, H

Liu, H (通讯作者)，Northeast Normal Univ, Ctr Adv Optoelect Funct Mat Res, Natl Demonstrat Ctr Expt Phys Educ, 5268 Renmin St, Changchun 130024, Peoples R China.;Liu, H (通讯作者)，Northeast Normal Univ, Minist Educ, Natl Demonstrat Ctr Expt Phys Educ, Key Lab UV Emitting Mat & Technol, 5268 Renmin St, Changchun 130024, Peoples R China.

OPTICS AND LASER TECHNOLOGY, 2023; 157 ():

Abstract

This paper proposes a static oblique lithography (SOL) strategy based on conventional digital micromirror device (DMD) projection lithography. This st......

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