Stacked Ge-Nanosheet GAAFETs Fabricated by Ge/Si Multilayer Epitaxy

Chu, CL; Wu, K; Luo, GL; Chen, BY; Chen, SH; Wu, WF; Yeh, WK

Luo, GL (reprint author), Natl Appl Res Labs, Natl Nano Device Labs, Hsinchu 300, Taiwan.

IEEE ELECTRON DEVICE LETTERS, 2018; 39 (8): 1133

Abstract

Horizontally stacked Ge-nanosheet gate-all-around FETs (GAAFETs) are demonstrated for the first time. The Ge/Si multilayers instead of the typically u......

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