A comparative study of C-x(X=4, 5, 7)F-8 plasmas for dry etch processing

Sung, DI; Tak, HW; Kim, DW; Yeom, GY

Yeom, GY (corresponding author), Sungkyunkwan Univ SKKU, Sch Adv Mat Sci & Engn, Suwon 16419, Gyeonggi Do, South Korea.; Yeom, GY (corresponding author), Sungkyunkwan Univ, SKKU Adv Inst Nano Technol SAINT, Suwon 16419, Gyeonggi Do, South Korea.

MATERIALS EXPRESS, 2020; 10 (6): 903

Abstract

In this study, the SiO2 etch characteristics of perfluorocarbon such as C4F8, C5F8, and C7F8 were investigated using inductively coupled plasmas (ICPs......

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