Hydrogen Plasma-Based Medium Pressure Chemical Ionization Source for GC-TOFMS

Brakling, S; Kroll, K; Klee, S; Benter, T; Kersten, H

Brakling, S (通讯作者)，Univ Wuppertal, Dept Phys & Theoret Chem, D-42119 Wuppertal, Germany.;Brakling, S (通讯作者)，TOFWERK AG, CH-3645 Thun, Switzerland.

JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY, 2022; 33 (3): 499

Abstract

The construction, critical evaluation, and performance assessment of a medium-pressure (2-13 mbar), high-temperature chemical ionization (CI) source f......

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