OPTIMIZATION AND STABILITY OF CD VARIABILITY IN PITCH 40 NM CONTACT HOLES ON NXE:3300

Van Look, L; Bekaert, J; Frommhold, A; Hendrickx, E; Rispens, G; Schiffelers, G

Van Look, L (reprint author), IMEC, Kapeldreef 75, B-3001 Leuven, Belgium.

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018; 10809 ():

Abstract

Controlling the Global and Local CD uniformity (GCDU & LCDU) of Contact Holes (CH) and the associated edge placement errors are important for the ......

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