Copper removal from semiconductor CMP wastewater in the presence of nano-SiO2 through biosorption

Wang, XY; Buer, G; Fan, W; Gao, L; Huo, MX

Fan, W (corresponding author), Northeast Normal Univ, Natl Environm Protect, Engn Lab Water Pollut Control & Resources, Changchun 130117, Peoples R China.

WATER REUSE, 2021; 11 (2): 289

Abstract

Copper-bearing wastewater from chemical mechanical planarization (CMP) is a typical semiconductor development byproduct. How to effectively treat Cu2+......

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