Scheduling of Dual Resource Constrained Lithography Production: Using CP and MIP/CP

Ham, A

Ham, A (reprint author), Liberty Univ, Ind & Syst Engn Dept, Lynchburg, VA 24501 USA.

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2018; 31 (1): 52

Abstract

A dual resource constrained (DRC) scheduling problem arises at the photolithography area in semiconductor manufacturing wherein reticles are required ......

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