Advanced Application of Pattern-Aware OPC

Chen, J; Yeh, SS; Zhu, A; Yenikaya, B; Hsu, FH; Mai, YC; Lin, L; Lai, N

Chen, J (reprint author), Cadence Design Syst Inc, 2F,6-5 Du Sing Rd,Hsinchu Sci Pk, Hsinchu, Taiwan.

OPTICAL MICROLITHOGRAPHY XXX, 2017; 10147 ( ):

Abstract

For advanced technology nodes, it's critical to address yield issues caused by process specific layout patterns with limited process window. RETs such......

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