Efficient Tunnel Junction Lithographic Aperture 940 nm VCSEL

Pissis, A; Duda, E; Tirelli, S; Siegenthaler, U; Quandt, D; Bonfrate, D; Kanungo, PD; Spieser, M; Zibik, E

Pissis, A (通讯作者)，II VI Laser Enterprise GmbH, CH-8045 Zurich, Switzerland.

IEEE PHOTONICS TECHNOLOGY LETTERS, 2023; 35 (7): 389

Abstract

We report on oxide free 940 nm VCSELs based on a buried tunnel junction acting as a lithographic aperture and achieving power conversion efficiency ab......

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