Atomic Layer Deposition (ALD) of Metal Gates for CMOS

Zhao, C; Xiang, JJ

Zhao, C; Xiang, JJ (reprint author), Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China.; Zhao, C; Xiang, JJ (reprint author), Univ Chinese Acad Sci, Beijing 101408, Peoples R China.

APPLIED SCIENCES-BASEL, 2019; 9 (11):

Abstract

Featured Application Metal gate of CMOS devices. Abstract The continuous down-scaling of complementary metal oxide semiconductor (CMOS) field effect t......

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