HCl-Based Hydrothermal Etching Strategy toward Fluoride-Free MXenes

Wang, CD; Shou, HW; Chen, SM; Wei, SQ; Lin, YX; Zhang, PJ; Liu, ZF; Zhu, KF; Guo, X; Wu, XJ; Ajayan, PM; Song, L

Song, L (corresponding author), Univ Sci & Technol China, CAS Ctr Excellence Nanosci, Natl Synchrotron Radiat Lab, Hefei 230029, Anhui, Peoples R China.; Ajayan, PM (corresponding author), Rice Univ, Dept Mat Sci & NanoEngn, Houston, TX 77005 USA.

ADVANCED MATERIALS, 2021; 33 (27):