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chemical vapor deposition

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期刊简介

期刊简介
GetPortalImpactFactorByIdResp(projectId=1, id=22f41452, cover=https://img.medsci.cn/images/journal/cover/2021/hBq_202109271314404730.jpg, fullname=chemical vapor deposition, abbr=CHEM VAPOR DEPOS, pyear=暂无数据, frequence=Monthly, articleNumbers=0, citedSelf2015=0.0, acceptanceRate=null, submissionToAcceptance=null, averageReviewTime=暂无数据, reviewFee=null, pageFee=null, publishedRatio=2018年中国人文章占该期刊总数量暂无数据 (2017年为暂无数据), issn=0948-1907, greenSci=https://www.greensci.net/search?kw=0948-1907, scijournal=https://www.scijournal.org/impact-factor-of-CHEM-VAPOR-DEPOS.shtml, medsciHotlightString=null, medsciHotlightRealtime=0.841, medsciHotlight=0.715, medsciHotlight5year=1.52063, citescore=0.0, hIndex=58, impactFactor=null, orgnization=John Wiley & Sons Ltd., orgnizationUrl=http://www.interscience.wiley., country=United Kingdom, countryCn=英国, isOa=0, isOaString=否, sciScie=Science Citation Index|Science Citation Index Expanded|Current Contents - Physical, Chemical &amp; Earth Sciences|Current Contents - Engineering, Computing &amp; Technology, bigclassCas=工程技术 3区, smallclassCas=, website=https://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-3862, websiteHits=3289, guideForAuthor=null, guideForAuthorHits=1, submitWebsite=, submitWebsiteHits=1, content=Chemical Vapor Deposition (CVD) publishes Reviews Short Communications and Full Papers on all aspects of chemical vapor deposition and related technologies along with other articles presenting opinion news conference information and book reviews. All papers are peer-reviewed in the usual Advanced Materials quality. Chemists physicists and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry materials chemistry organometallics applied physics and semiconductor technology thin films and ceramic processing now have a unified forum for their work. Kurztext Dünne Schichten die durch chemische Abscheidung aus der Gasphase (CVD) hergestellt werden sind aus der heutigen Technik nicht mehr wegzudenken. Für alle die sich mit diesem jungen interdisziplinären Gebiet befassen gibt es jetzt die Zeitschrift Chemical Vapor Deposition . Publiziert werden anspruchsvolle "Full Papers" "Review Articles" und "Communications". Readers Materials scientists chemists physicists, totalCites=null, brief=CHEM VAPOR DEPOS杂志工程技术行业,“<strong><a target="_blank" href="/sci/index.do?smallclass=材料科学:膜" >材料科学:膜</a></strong>”子行业的优秀级杂志, articleType=绝大部分收录论著,也接收少量其它类型文章, medsciHeat=<span style="color: #990000;">暗红</span>, medsciComment=CHEM VAPOR DEPOS杂志级别还可以,但是相对来说,比较冷门,关注人数偏少,有些可能是国内不太熟悉,但该杂志在国际仍然有相当知晓度的。因为缺少中国人投稿,稿源可能未必丰富,发表有可能有很大的机会哦。, medsciExplanation=MedSci期刊指数是根据中国科研工作者(含医学临床,基础,生物,化学等学科)对SCI杂志的认知度,熟悉程度,以及投稿的量等众多指标综合评定而成。当然,具体的,您还可以结合“<a href='https://www.medsci.cn/sci/submit.do?id=22f41452'>投稿经验系统</a>”,进行综合判断,这更是大家的实战经验,值得分享和参考。<br> 注意,上述MedSci期刊指数采用MedSci专利技术,由计算机系统自动计算,并给出建议,存在不准确的可能,仅供您投稿选择杂志时参考。, tags=null, citeScoreList=[GetImpactFactorCiteScoreListResponse(year=2012, citescore=0.0), GetImpactFactorCiteScoreListResponse(year=2013, citescore=1.38), GetImpactFactorCiteScoreListResponse(year=2014, citescore=1.62), GetImpactFactorCiteScoreListResponse(year=2015, citescore=1.79), GetImpactFactorCiteScoreListResponse(year=2016, citescore=1.9)], medsciIndexList=[GetImpactFactorMedsciIndexListResponse(year=2019, medsciHotlight=2.796), GetImpactFactorMedsciIndexListResponse(year=2021, medsciHotlight=0.478), GetImpactFactorMedsciIndexListResponse(year=2022, medsciHotlight=0.626), GetImpactFactorMedsciIndexListResponse(year=2023, medsciHotlight=0.769), GetImpactFactorMedsciIndexListResponse(year=2024, medsciHotlight=0.841)], citeScoreGradeList=[], totalJcrAreaList=[GetImpactFactorCiteScoreGradeResponse(smallClass=ELECTROCHEMISTRY, rank=Q4), GetImpactFactorCiteScoreGradeResponse(smallClass=MATERIALS SCIENCE, COATINGS & FILMS, rank=Q3), GetImpactFactorCiteScoreGradeResponse(smallClass=PHYSICS, CONDENSED MATTER, rank=Q3)], pmcUrl=https://www.ncbi.nlm.nih.gov/nlmcatalog?term=0948-1907[ISSN], pubmedUrl=https://www.ncbi.nlm.nih.gov/pubmed?cmd=search&term=CHEMICAL VAPOR DEPOSITION[ta], article_number=0, article_number_cn=null, earlyWarning=null, linkOutUrl=null, isJournalMember=false, unscrambleContent=null, dayViewCount=false, endexampletyle=暂无数据)
期刊名称
CHEM VAPOR DEPOS/chemical vapor deposition
ISSN
0948-1907
影响指数话题
预警等级
MedSci期刊指数
0.841 (MedSci实时期刊指数) | 1.52063 (5年期刊指数)
CiteScore值
0.0
h-index
58
h5-median
暂无数据
出版社/管理机构
杂志由 John Wiley & Sons Ltd. 出版或管理
出版国家/地区
United Kingdom 英国
出版周期
Monthly
出版年份
暂无数据
是否OA
被收录情况
Science Citation Index|Science Citation Index Expanded|Current Contents - Physical, Chemical &amp; Earth Sciences|Current Contents - Engineering, Computing &amp; Technology
JCR分区
ELECTROCHEMISTRY Q4
MATERIALS SCIENCE, COATINGS & FILMS Q3
PHYSICS, CONDENSED MATTER Q3
中科院分区
大类:工程技术 3区
小类: