期刊： JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2021; 20 (1)
Background: As semiconductor technologies continue to shrink, optical proximity correction may not have enough space to optimize layout due to limitat......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2020; 19 (1)
Background: The piezoelectric microvibratory stage as a microelectromechanical system (MEMS) actuator can tilt around the X/Y axis and translate along......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2020; 19 (2)
Background: Microfluidics has been widely used in the biological and medical fields, and polymers are the most widely used materials in microfluidics ......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2020; 19 (3)
Source mask and polarization optimization (SMPO) is a promising extension of the widely used resolution enhancement technology, source mask optimizati......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2020; 19 (3)
Background: Molecular logic circuits have great potential applications. DNA logic circuit is an important research direction of DNA computing in nanot......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (1)
In optical lithography, aberrations induced by lens heating effects of a projection lens lead to degradation of imaging quality. In order to compensat......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (4)
Microsystem technology is well suited to batch fabricate microhemispherical resonator gyroscopes (HRG) to reduce cost and volume. In the processing of......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (4)
An optimized source has the ability to improve the process window during lithography in semiconductor manufacturing. Source optimization is always a k......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (2)
We present a simple method of deep anisotropic etching of silicon up to 400 mu m with nearly vertical sidewall profile for thermopile devices. The met......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (2)
Background: As semiconductor technologies continue to shrink, the growth in the number of process variables and combined effects tighten the overall p......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (2)
A methodology to evaluate the electrical contact between nanowire (NW) and source/drain in NW FETs was investigated with SEM voltage contrast (VC). Th......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (2)
Overlay control has been one of the most critical issues for manufacturing of leading edge semiconductor devices. Introduction of the double patternin......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (2)
The influence of the e-beam aperture angle on the critical dimensions (CD)-scanning electron microscope measurements for a high aspect ratio (AR) stru......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (3)
The contamination control of silicon wafer surface is more and more strict. Many investigations have been done to inspect defects on silicon wafer. Ho......
期刊： JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (3)
Background: Extreme ultraviolet (EUV) lithography was introduced for the high-volume manufacturing of stateof-the-art semiconductor devices in 2019. O......
