CD metrology for EUV resist using high-voltage CD-SEM: shrinkage, image sharpness, repeatability, and line edge roughness

Bizen, D; Mizutani, S; Sakakibara, M; Suzuki, M; Momonoi, Y

Bizen, D (reprint author), Hitachi Ltd, Kokubunji, Tokyo, Japan.; Bizen, D (reprint author), Hitachi High Technol Corp, Hitachinaka, Ibaraki, Japan.

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019; 18 (3):

Abstract

Background: Extreme ultraviolet (EUV) lithography was introduced for the high-volume manufacturing of stateof-the-art semiconductor devices in 2019. O......

Full Text Link


Links

期刊讨论 | 中国SCI论文 | 期刊主页 | 投稿经验 | 杂志官网 | 投稿链接 | 作者需知 | PMC链接 | Pubmed全文检索