Plasma deposition-Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Vallee, C; Bonvalot, M; Belahcen, S; Yeghoyan, T; Jaffal, M; Vallat, R; Chaker, A; Lefevre, G; David, S; Bsiesy, A; Posseme, N; Gassilloud, R; Granier, A

Vallee, C; Bonvalot, M (corresponding author), Univ Grenoble Alpes, LTM, F-38000 Grenoble, France.; Vallee, C (corresponding author), Univ Tsukuba, Tsukuba, Ibaraki 3058573, Japan.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020; 38 (3):

Abstract

In this paper, the emerging role of ionic species in plasma assisted chemical deposition processes is discussed in detail for commemorating the Career......

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