Using a triblock copolymer as a single additive in high aspect ratio through silicon via (TSV) copper filling

Wang, FL; Tian, YH; Zhou, K; Yang, R; Tan, T; Wang, Y; Yao, WH

Wang, FL (corresponding author), Cent South Univ, State Key Lab High Performance Complex Mfg, Changsha 410083, Peoples R China.

MICROELECTRONIC ENGINEERING, 2021; 244 ():

Abstract

Through silicon via (TSV) is a promising interconnect technology in three-dimensional (3D) integration which has large packing density, improves effic......

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