Sidewall Metallization on CMOS MEMS by Platinum ALD Patterning

Lin, YC; Chung, VPJ; Santhanam, S; Mukherjee, T; Fedder, GK

Lin, YC (corresponding author), Carnegie Mellon Univ, Dept Elect & Comp Engn ECE, Pittsburgh, PA 15213 USA.

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2020; 29 (5): 978

Abstract

Patterned atomic layer deposition (ALD) that selectively coats sidewalls with platinum (Pt) is developed to improve performance on CMOS MEMS devices. ......

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