Selective ALD Mo Deposition in 10nm Contacts

van der Veen, MH; Maes, JW; Pedreiral, OV; Zhu, C; Tiernol, D; Datta, S; Jourdan, N; Decosterl, S; Wu, C; Mousa, M; Byun, Y; Struyf, H; Park, S; Tokei, Z

van der Veen, MH (通讯作者)，Imec, Kapeldreef 75, Leuven, Belgium.

2023 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, IITC AND IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE, MAM, IITC/MAM, 2023; ():

Abstract

Selective atomic layer deposition (ALD) of Mo is explored to fill 10nm contacts in a 2 nm node test vehicle. The ALD Mo deposition is highly selective......

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