Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition

Wang, C; Bao, CH; Wu, WY; Hsu, CH; Zhao, MJ; Lien, SY; Zhu, WZ

Lien, SY (corresponding author), Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen 361024, Peoples R China.; Lien, SY (corresponding author), Xiamen Univ Technol, Fujian Key Lab Optoelect Technol & Devices, Xiamen 361024, Peoples R China.; Lien, SY (corresponding author), Dayeh Univ, Dept Mat Sci & Engn, Changhua 51591, Taiwan.

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021; 39 (3):

Abstract

In this study, amorphous films of molybdenum oxide (MoOx) had been prepared by plasma enhanced atomic layer deposition (PEALD) technique using molybde......

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